... this thesis 2.1.1 Pulsed- laserdeposition One of the most significant approaches to oxide film growth is pulsed- laserdeposition Pulsed- laserdeposition (PLD) is now a widely used deposition approach ... [3,4], pulsed- laserdeposition (PLD) [5], and sputtering [6], as well as chemical vapor deposition( CVD) With physical depositionof oxides, the phase elements are delivered as a flux of individual ... and physical properties of CoFe2O4 x Chapter Introduction 1.1 The application ofoxide film Within the class of inorganic materials, oxides may have the most diverse range of functions The interaction...
... The result of EDX analysis ofZnO nanoparticles indicates that the ZnO nanoparticle contains 100% ZnO void of template Conclusions We have successfully synthesized ZnO nanoparticles by a simple ... boundary (GB) area, i.e the ratio of GB area to grain volume SGB [13] FM ofZnO is Mn-doped ZnO are observed only if the grain boundary area in the unit volume of the material is greater than a ... 320 330 340 350 Wavelength (nm) 40 35 Fig SEM image ofZnO nanoparticles and EDX spectra of the prepared ZnO nanoparticles with composition of elements 25 20 2 -2 (αhν) x 10 (eV m ) 30 15 10 2.50...
... measure the magnetic properties of the samples PulsedLaserDeposition Technique Pulsedlaserdeposition (PLD) has clearly emerged as one of the premier thin film deposition techniques for multi-elemental ... reproduction of the stoichiometry of the charged material and in situ depositionof oxides without the requirement of any post -deposition process adds to the advantage of the technique On top of all ... involved in the laser- target interaction is extremely complex It depends critically on the laser beam Laser Heater plume Target Substrate Figure : Schematic diagram of a pulsedlaserdeposition chamber...
... such as pulsedlaser deposition, sputtering, screen printing, sol-gel and metalorganic chemical vapor deposition (MOCVD).1-7 The deposition techniques used in this thesis are pulsedlaserdeposition ... None of this would be possible without their love and concern ii Table of Contents Page Acknowledgements i Table of Contents iii Summary vi List of Publications ix List of Figures x List of Tables ... schematic drawing of the pulsedlaserdeposition (PLD) system All substrates were first cleaned using nitric acid in an ultrasonic cleaner for to remove any natural oxide layer or oxide contaminant...
... techniques used for the analysis of material properties are described 2.1 Pulsedlaserdeposition (PLD) system Pulse laserdeposition (PLD) is a well-established thin film deposition technique for growing ... and pulsed duration of about 23 ns was used 30 The laser beam is guided through a focusing lens (f = 50 cm) The high quality of film deposition demands a uniform and focused laser beam A set of ... thin film deposition was adjusted through changing the flow rate and the pumping speed of 32 turbo-pump 2.1.2 Mechanism of film growth using PLD system The principle ofpulsedlaser deposition, ...
... two most important types ofoxide semiconductors: zincoxide and titanium dioxide The review of the oxide based DMS (ODMS) will be discussed further in session 1.2 1.2 Oxide Dilute Magnetic Semiconductor ... washing the substrates, pulse laserdeposition was carried out and the technique is described in following session 2.1.2 Pulsedlaserdeposition (PLD) Pulsedlaserdeposition (PLD) finds more and ... property of Co-doped ZnO thin films 76 4.3.1.4 Optical property of Co-doped ZnO thin films 81 4.3.2 Co-doped ZnO thin films on quartz SiO2 substrate ….……………… 82 4.3.2.1 Structure of Co-doped- ZnO...
... al Effect ofZnO NPs on ToxRp Fig Far-UV CD spectra of ToxRp in the presence of varying concentrations of KCl in the absence and presence ofZnO NPs (Fig S3) indicated that the effect of NPs on ... effect ofZnO NPs on the structure of ToxRp, alone and in the presence of denaturing agents, and determined the thermodynamic parameters of binding ToxRp is the 96-residue C-terminal domain of the ... T Chatterjee et al Effect ofZnO NPs on ToxRp Table Two-state analysis of the unfolding of ToxRp using GdnHCl or urea, performed in the presence and the absence ofZnO NP GdnHCl Urea ToxRp )1...
... gap (Eg) of the zincoxide film which was found to be Eg ≈ 3.33 eV a b Fig Polarized spectra ofZnO sample, with Is = sin2Ψsin∆ (a) and Ic = sin2Ψcos∆ (b) Fig Transmittance spectra of glass substrate ... note that the ZnO spectrum quite appears in the same transparent region of the substrate This means, the glass substrate did not affect to the shape of transmission spectrum of coated ZnO film From ... bias voltage of V = 350 V The deposition time was of about 70 and the average deposition rate was evaluated as 1.5 Å/s The ellipsometric measurement is normally expressed in terms of a polarization...
... the case has shown to be” in pulsed ruby (d=O.694 pm) and frequency doubled Nd:YAG (/2=0.532 pm) laser irradiation of silicon layers, and in absorption detection of defects in a-Si:H films.” ... expression for the normal incidence reflectivity of bulk material surfaces, ~~,,,=[(n-1)2+~]/[(n+1)2+k?]=0.545 Measurements of the laser pulse temporal profile have shown that the pulse fluence F is ... peak temperature occurs approximately at a time of 15 ns The temperature profiles across the thickness of the silicon layer are shown in Fig for a laser fluence, F= 1.6 mJ/cm’ The experimental...
... concentration of Zn(NO3)2 and hexamine) was changed every h during the growth process; (a) mM of Zn2+, (b) mM of Zn2+ and (c) 10 mM of Zn2+ Table Summary of width, length and aspect ratio ofzincoxide ... transforms to ZnO Hexamine is a chelating agent that attaches to ZnO microrods securing ZnO non polar facets (1 0) from the depositionof Zn2+, therefore degradation of hexamine lead to a lack of complete ... image analysis software (ImageJ software) 2.3 A catalyst support application ofZnO microrods on cordierite subtrates 2.3.1 Preparation copper /zinc oxide microrod catalysts (Cu ZnO MR) Copper...
... different parts of a nanowhisker as inserted between Figs 2(c) and 2(d) The lattice fringes of the stem with the d spacing of 0.26 nm match the interspacing of (0002) planes of the wurtzite ZnO, while ... the branching fibers of the ZnO network FIG SEM and HRTEM images of the ZnO network (a) Six-fold symmetrically aligned ZnO array corresponding to the inserted gold pattern on ZnO buffer layer (b) ... aligned array ofZnO is self-organized in six symmetrical directions and the diameter of the fibers is about several hundreds of nanometers, and the ASE present a FWHM of nm with a threshold of about...
... materials 38 2.16 Phase diagram of ZnO- Al2O3 system 44 3.1 Deposition rates of sputtered ZnO thin films 51 3.2 (a) Top view ofzincoxide thin film array with four sensing ... section of the proposed gas sensor array with CMOS-circuitry [38] 33 2.4 Zincoxide 2.4.1 Properties ofZnOZincoxide is an interesting II-VI compound semiconductor with a wide direct bandgap of ... and single crystal ZnO [47, 49] The diffusion of Zn in ZnO was observed during heating in a zinc vapor environment with the use of radioactive zinc The diffusion coefficient ofzinc was reported...
... areas Effect of the type ofzinc salt on ZnO structure morphology To investigate the formation mechanism of this interesting micro-tube structure by the assembly of nanoflakes composed of nanoparticles, ... day The final ZnO product was obtained by calcination of the precipitate at 300°C for h in air To examine the effect ofzinc salt on the morphology of obtained ZnO, an inorganic zinc salt, ZnSO4·7H2O, ... obtained ZnO final product Thus, the type ofzinc salts (organic or inorganic) is not the determining factor on the formation ofZnO microtubes Precipitation reagent concentration effect on ZnO structure...
... (c) zinc ammine complexes, (d) zinc hydroxide complexes and (e) total zinc ion concentration respectively 22 Figure 2.2 Variation of solubility ofzinc with pH The solubility ofzinc ... studies the growth ofZnO nanorods and films in aqueous solution using zinc acetate and ammonium hydroxide in detail Regardless of the type of substrate used, the solubility ofzinc (SZn), interface ... ZnO surface 34 Figure 2.9 Adsorption of Zn2+ ions depends on the pH of the solution Highest rate of adsorption when the pH is higher than the PZC ofZnO 34 Figure 3.1 TEM image of...
... Synthesis ofZnO and its Properties……………………… ………….87 5.2.1.1 Synthesis ofZnO by Sputtering………………………… ….87 5.2.1.2 Synthesis ofZnO on Different Substrates………………… 88 5.2.1.3 Synthesis ofZnO on ... (InCl3) were some of the dopant salts found in hydrothermal synthesis of dopedZnO.35-40 The influence of H3BO3 on ZnO morphology is given in Fig 1.3.38 Fig 1.3 SEM images ofZnO nanorods synthesized ... Parkansky et al, ZnO nanorods are obtained after annealing ofZnO films at 300 oC.81 13 Chapter 1: Introduction Wee Rui Qi Fig 1.9 SEM images of (a) ZnO nano-needles on ZnO/ Zn /ZnO multilayer structure...
... Stability ofzincoxide nanoparticles in aqueous environment 17 2.2 Ecotoxicity effects ofzincoxide nanoparticles 19 2.2.1 Mechanisms ofzincoxide nanoparticles 21 2.2.2 Effects ofzincoxide ... characterization of ZnO- NPs and removal of ZnO- NPs by the MBR system were also monitored in Phase and 10 LITERATURE REVIEW 2.1 Zincoxide nanoparticles Zincoxide nanoparticles (ZnO- NPs), with ... 100 5.1 Effects ofZnO NPs on removal efficiencies 100 5.2 Effects ofZnO NPs on sludge characteristics 101 5.3 Effects ofZnO NPs on bacteria community in MBR 101 5.4 Fate ofZnO NPs in MBR 102...
... - Chapter NiSi thin film fabrication by PulsedLaserDeposition (PLD) 3.1 PulsedLaserDeposition Introduction ofpulsedlaserdepositionPulsedlaserdeposition is a technique for fabricating ... schematic diagram of a PulsedLaserDeposition system The PLD method of thin film growth involves evaporation of a solid target in a high vacuum chamber by means of short and high-energy laser pulses ... 2.3 Basic Theory 10 2.5 References 15 Chapter NiSi thin film fabrication by PulsedLaserDeposition 3.1 PulsedLaserDeposition 17 3.2 Rapid thermal processor 19 iii 3.3 Experimental 22 3.4 References...
... LeBlanc On Final Examination Dean, College of Engineering An Abstract of Sputter Depositionof Iron Oxide and Tin Oxide Based Films and the Fabrication of Metal Alloy Based Electrodes for Solar ... The University of Toledo College of Engineering I HEREBY RECOMMEND THAT THE THESIS PREPARED UNDER MY SUPERVISION BY Daniel Sporar ENTITLED Sputter Depositionof Iron Oxide and Tin Oxide Based Films ... Fulfillment of the Requirement for The Master of Science in Chemical Engineering The University of Toledo May 2007 This M.S Thesis describes the fabrication and characterization of n-type iron (III) oxide...
... chemical vapor deposition for the growth of the ZnO : N layer and sputtering deposition for the growth of the i -ZnO and n+ -ZnO : Al layers Their results led them to propose the existence of an electron ... MgZnO and CdZnO alloys for band-gap engineering 7.1 Synthesis and characterization of MgZnO and CdZnO alloys 7.2 Heterostructures 7.3 Deformation potentials and band alignments in MgZnO and CdZnO ... been observed for MgZnO alloys [117] CdZnO alloys with Cd concentrations of 7% and band gap of 3.0 eV were grown on sapphire (0 0 1) and ScAlMgO4 substrates using pulsed- laserdeposition [116] While...
... Growth Mechanism 20 25 30 ZnO (002) PL Measurements 35 40 45 ZnO (110) ZnO (102) ZnO (101) ZnO (100) Intensity, a.u ZnS (111) To understand the growth mechanism ofZnO nanorods obtained with ... Effect of Thiocarbamide on Morphology ofZnO Nanorods Figure illustrates the SEM images ofZnO nanorods deposited onto SnO2 covered glass substrates by the spray pyrolysis process using zinc chloride ... and zinc chloride containing thiocarbamide additive adjusting the molar ratio of Zn:tu = 1:0.25 (Fig 1b) Zinc chloride concentration in solution of 0.05 mol/L and deposition temperature of 520...